AEM SERIES

Thin Film Coater

The Main Features

01 The equipment is mainly used for the plating of metal film.

02 The structure of the upper and lower two chambers, high vacuum exhaust system with mechanical pump molecular pump condensate pump, to achieve oil free exhaust, high efficiency, energy saving.

03 A high stable and reliable EB evaporation source.

04 One RH source (Multiple RH sources are optional)

05 Six sensor crystal thin film deposition controller monitors both thickness and deposition rate of the process.

06 Automatic coating process controlling system through the build-in SCS (Smart Coating System) software.

Specifications

Model AEM SERIES
Vacuum Chamber Ø300mm x 1350mm selectable
Dome Size Depends on the size of the cavity configuration
Dome Rotation Speed 0rpm-60rpm (Adjustable)
Crystal Thin Film Thickness Monitoring System XTC/3+6 Crystal Sensors
Evaporation Sources 2EB Source;1 RH Sources (Multiple RH Sources Optional)
Ion Source Hall Ion Source or RF Ion source
Exhaust System Mechanical pump + molecular pump + condensate pump optional

Performance

IItem Content
Vacuum property Limiting vacuum ≦2E-5Pa
Vacuum pumping speed The time of pumping the process chamber from the atmosphere to 5E-4Pa is ≦20 minutes
Vacuum chamber leakage rate ≦6E-3Pa·L/s